Intel Corp v. Demaray LLC

David L. Cavanaugh

Richard Goldenberg

Naveen Modi

Benjamin W. Hattenbach

Hong A. Zhong

Prosecution History analysis

Examiner Search analysis

Invalidity Framework analysis

Intel targets sputtering deposition patent: Barber & Hirose art cited for claims 1-13 as obvious over combining a known RF filter with a plasma reactor.

Demaray LLC

Applied Materials Inc

Intel Corp

Samsung Electronics Co Ltd

Last Docket Entry Date

Total Docket Entries

IPR2021-01030 | Intel Corp v. Demaray LLC | Ex Parte

Patent Trial and Appeal Board

Judge	Cases	Inst. Rate	FWD Inv. Rate
Christopher L Crumbley	500+	62%	75%
Kimberly McGraw	300+	61%	67%
Kristina M Kalan	500+	63%	75%

Name	Ratings
Intel Corp	L5 D
Samsung Electronics Co Ltd	L5 A
Applied Materials Inc	L2 C

Name	Ratings
Paul Hastings LLP	L5 A
Naveen Modi	L5 A
Wilmer Cutler Pickering Hale Dorr LLP	L5 E
Richard Goldenberg	L5 A
David L. Cavanaugh	L5 A

Name	Ratings
Irell & Manella LLP	L5 A
Hong A. Zhong	L4 A
Benjamin W. Hattenbach	L2 B